Edit Blemish Mask


The Edit Blemish Mask command is used to enter the region description for image blemishes. These coordinates are used by other commands to correct pixel artefacts on an image using the Apply Blemish Mask method in the Image Calibration Pipeline. Blemish information is entered into the editor, then saved to a blemish file.

Mira blemish masks use a .blm file extension .

The dialog above shows 2 blemishes: a bad column over [10:10, 1:600] and a 3 column wide region over [400:402, 320:351]. Entries in the Notes column are optional.

Creating a New Mask:
Changing an Existing Mask:

Working with Blemish Masks

In the context of cosmetic image repairs, a blemish is a defect larger than a single pixel point,. although this command can repair point defects as well. Blemishes can appears as a horizontal or vertical line or a small region where the pixels do not record image data in the correct way or in a way that can be corrected. Point defects can also be repaired using the Apply Pixel Mask method. There are two ways to create a pixel mask, as described for the Edit Pixel Mask and Create Pixel Mask commands.

A Blemish Mask is stored in a text file having a .blm extension, such asBlemish-list.blm. Each line of the blemish mask file contains the column range X min toX max and the row range Y min to Y max for a single blemish. The Notes column holds an optional comment for the blemish. For example, the first line in the dialog above defines a line defect at column 155, extending from row 44 through row 125. This is commonly called a "partial bad column".

Note

Remember that coordinates in Mira are 1-based, meaning that pixel (1,1) is the origin of the image array. See Image Coordinate System and Pixel Coordinate Definition.

Related Topics

Repairing Artefacts and Cosmetic Defects, Edit Pixel Mask, Cosmic Ray Filter, Apply Blemish Mask, Clean Image Set, Apply Pixel Mask, Express Image Calibration, Image Coordinate System