Edit Blemish Mask
The Edit Blemish Mask command is used to enter the region description for image blemishes. These coordinates are used by other commands to correct pixel artifacts on an image using the Apply Blemish Mask method in the Image Calibration Pipeline. Blemish information is entered into the editor, then saved to a blemish file.
Mira blemish masks use a .blm file extension .
The Edit Blemish Mask command opens from
the Image Window > Process >
Calibration menu and 
button
on the Main Toolbar. The "immediate"
form, shown first, opens when an image or image set is displayed in
the top-most window. The general form can be used to select source
images from folders, windows, or by matching templates.
The dialog above shows 2 blemishes: a bad column over [10:10, 1:600] and a 3 column wide region over [400:402, 320:351]. Entries in the Notes column are optional.
Type the X (column) andY (row) limits for each defect on a separate line of the table. The Notes entry is optional.
The editor adds lines in chunks of 100. If you run to the end of the buffer, right click on the table to open its context menu and select Append Rows. Then continue entering blemish data.
When you are finished editing the blemish mask,
click 
to save it to a file.
Click 
on the right end of
the Blemish Mask File field. Select
the blemish file and click [Open] to
load the blemish mask.
When you are finished editing the blemish mask,
click to save it to a file.
In the context of cosmetic image repairs, a blemish is a defect larger than a single pixel point,. although this command can repair point defects as well. Blemishes can appears as a horizontal or vertical line or a small region where the pixels do not record image data in the correct way or in a way that can be corrected. Point defects can also be repaired using the Apply Pixel Mask method. There are two ways to create a pixel mask, as described for the Edit Pixel Mask and Create Pixel Mask commands.
A Blemish Mask is stored in a text file having a
.blm extension, such
asBlemish-list.blm. Each
line of the blemish mask file contains the column range
X min to X
max and the row rangeY min to
Y max for a single blemish. The
Notes column holds an optional
comment for the blemish. For example, the first line in the dialog
above defines a line defect at column 155, extending from row 44
through row 125. This is commonly called a "partial bad
column".
|
Note |
Remember that coordinates in Mira are 1-based, meaning that pixel (1,1) is the origin of the image array. See Image Coordinate System and Pixel Coordinate Definition. |
Repairing Artifacts and Cosmetic Defects,
Mira Pro x64 8.72 User's Guide, Copyright Ⓒ 2024 Mirametrics, Inc.
All Rights Reserved.