Edit Blemish Mask


The Edit Blemish Mask command is used to enter the region description for image blemishes. These coordinates are used by other commands to correct pixel artifacts on an image using the Apply Blemish Mask method in the Image Calibration Pipeline. Blemish information is entered into the editor, then saved together into blemish file having a .blm file extension

The dialog above shows 2 blemishes: a bad row over [100:540,184] and a bad column over [1:532, 812]. These data were created for a new, empty blemish mask that yet has to be saved to a file. When the mask is saved in a file, the file name will appear in the Blemish Mask File field. Entries in the Notes column are optional.

Editing Blemish Masks

The Blemish Mask Editor is a realizable Table Editor window. The Mask file current loaded is listed in the drop edit field at the top of the window. Several important commands related to the data grid are located in a right-click context menu.

Creating a New Mask:

When you are finished typing and changing values, save using one of these methods:

Changing an Existing Mask:

     When you are finished typing and changing values, save using one of these methods:

Working with Blemish Masks

In the context of cosmetic image repairs, a blemish is a defect larger than a single pixel point,. although this command can repair point defects as well. Blemishes can appears as a horizontal or vertical line or a small region where the pixels do not record image data in the correct way or in a way that can be corrected. Point defects can also be repaired using the Apply Pixel Mask method. There are two ways to create a pixel mask, as discussed for the Edit Pixel Mask and Create Pixel Mask commands.

A Blemish Mask is stored in a text file having a .blm extension, likeBlemish-list.blm. Each line of the blemish mask file contains the column rangeX min to X max and the row range Y min to Y max for a single blemish. The Notes column holds an optional comment for the blemish. For example, the first line in the dialog above defines a line defect at column 155, extending from row 44 through row 125. This is commonly called a "partial bad column".

Note

Remember that coordinates in Mira are 1-based, meaning that pixel (1,1) is the origin of the image array. See Image Coordinate System and Pixel Coordinate Definition.

Related Topics

Repairing Artifacts and Cosmetic Defects, Pixel Mask Editor, Apply Cosmic Ray Filter, Apply Blemish Mask, Clean Image Set, Apply Pixel Mask, Image Coordinate System